In copper plating, a current of 0.5A is allowed for cathode area of 100cm2. If this current is maintained constant for 100 minutes, the thickness of the cop...

In copper plating, a current of 0.5A is allowed for cathode area of 100cm². If this current is maintained constant for 100 minutes, the thickness of the copper deposited will be approximately (the electrochemical equivalent of copper = 0.0003g/^oC, density of copper = 10^-4g/cm³ )